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DEVELOPMENTS IN SURFACE CONTAMINATION AND CLEANING VOL 2: PARTICLE DEPOSITION, CONTROL AND REMOVAL (HB 2010)

DEVELOPMENTS IN SURFACE CONTAMINATION AND CLEANING VOL 2: PARTICLE DEPOSITION, CONTROL AND REMOVAL (HB 2010)

DEVELOPMENTS IN SURFACE CONTAMINATION AND CLEANING VOL 2: PARTICLE DEPOSITION,
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DEVELOPMENTS IN SURFACE CONTAMINATION AND CLEANING VOL 2: PARTICLE DEPOSITION, CONTROL AND REMOVAL (HB 2010) Hardback - 2009 - 1st Edition

by KOHLI R

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USA Edition . New. Brand New! Fast Delivery US Edition and ship within 24-48 hours. Deliver by FedEx and Dhl, & Aramex, UPS, & USPS and we do accept APO and PO BOX Addresses. Order can be delivered worldwide within 6-10 days and we do have flat rate for up to 2LB. Extra shipping charges will be requested if the Book weight is more than 5 LB. This Item May be shipped from India, United states & United Kingdom. Depending on your location and availability.
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Details

  • Title DEVELOPMENTS IN SURFACE CONTAMINATION AND CLEANING VOL 2: PARTICLE DEPOSITION, CONTROL AND REMOVAL (HB 2010)
  • Author KOHLI R
  • Binding Hardback
  • Edition number 1st
  • Edition USA Edition
  • Condition New
  • Pages 312
  • Volumes 1
  • Language ENG
  • Publisher William Andrew, Norwich, New York, U.S.A.
  • Publication date 2009-11
  • Bookseller's Inventory # cbs 9781437778304
  • ISBN 9781437778304 / 1437778305
  • Weight 1.41 lbs (0.64 kg)
  • Dimensions 9.1 x 6.1 x 0.8 in (23.11 x 15.49 x 2.03 cm)
  • Category Technology & Industrial Arts
  • Dewey Decimal Code 620.44
  • Quantity available 51

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From the publisher

Rajiv Kohli and Kash Mittal have brought together the work of experts from different industry sectors and backgrounds to provide a state-of-the-art survey and best practice guidance for scientists and engineers engaged in surface cleaning or handling the consequences of surface contamination.

Topics covered include:

  • A systems analysis approach to contamination control
  • Physical factors that influence the behavior of particle deposition in enclosures
  • An overview of current yield models and description of advanced models
  • Types of strippable coatings, their properties and applications of these coatings for removal of surface contaminants
  • In-depth coverage of ultrasonic cleaning
  • Contamination and cleaning issues at the nanoscale
  • Experimental results illustrating the impact of model parameters on the removal of particle contamination

The expert contributions in this book provide a valuable source of information on the current status and recent developments in surface contamination and cleaning. The book will be of value to industry, government and academic personnel involved in research and development, manufacturing, process and quality control, and procurement specifications across sectors including microelectronics, aerospace, optics, xerography and joining (adhesive bonding).

ABOUT THE EDITORS

Rajiv Kohli is a leading expert with The Aerospace Corporation in contaminant particle behavior, surface cleaning, and contamination control. At the NASA Johnson Space Center in Houston, Texas, he provides technical support for contamination control related to ground-based and manned spaceflight hardware for the Space Shuttle, the International Space Station, and the new Constellation Program that is designed to meet the United States Vision for Space Exploration.

Kashmiri Lal "Kash" Mittal was associated with IBM from 1972 to 1994. Currently, he is teaching and consulting in the areas of surface contamination and cleaning, and in adhesion science and technology. He is the Editor-in-Chief of the Journal of Adhesion Science and Technology and is the editor of 98 published books, many of them dealing with surface contamination and cleaning.

Also available

Developments in Surface Contamination and Cleaning, Volume 1: Fundamentals and Applied Aspects (edited by Rajiv Kohli & K.L. Mittal). ISBN: 9780815515555.

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