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High-k materials in Dynamic Random Access Memories (DRAM): Atomic scale engineering of HfO2-based dielectrics for future DRAM applications

High-k materials in Dynamic Random Access Memories (DRAM): Atomic scale engineering of HfO2-based dielectrics for future DRAM applications

High-k materials in Dynamic Random Access Memories (DRAM): Atomic scale
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High-k materials in Dynamic Random Access Memories (DRAM): Atomic scale engineering of HfO2-based dielectrics for future DRAM applications Paperback - 2011

by Dudek, Piotr

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Sudwestdeutscher Verlag Fur Hochschulschriften AG, 2011-12-23. paperback. New. 5.91x0.26x8.66. Buy with confidence. Excellent Customer Service & Return policy.
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Details

  • Title High-k materials in Dynamic Random Access Memories (DRAM): Atomic scale engineering of HfO2-based dielectrics for future DRAM applications
  • Author Dudek, Piotr
  • Binding Paperback
  • Condition New
  • Pages 112
  • Volumes 1
  • Language ENG
  • Publisher Sudwestdeutscher Verlag Fur Hochschulschriften AG
  • Publication date 2011-12-23
  • Bookseller's Inventory # DADAX3838130189
  • ISBN 9783838130187 / 3838130189
  • Weight 0.39 lbs (0.18 kg)
  • Dimensions 9 x 6 x 0.27 in (22.86 x 15.24 x 0.69 cm)
  • Size 5.91x0.26x8.66
  • Category Science
  • Quantity available 1

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Reader reviews for High-k materials in Dynamic Random Access Memories (DRAM): Atomic scale engineering of HfO2-based dielectrics for future DRAM applications

From the publisher

I would like to give you an outstanding opportunity to experience more about modern materials for Dynamic Random Access Memories. Therefore I give this book into your hands. You will find here a theory chapter focusing on DRAM physics as well as a deep description of deposition and characterization methods used in this work. Finally, you will discover how to engineer materials on an atomic scale and how to investigate those thin films.
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